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Tantalum pentoxide, Ta2O5, is a high-index, low-absorption material usable for coatings in the near-UV (350 nm) to IR (>8 μm) regions. Dense, hard layers can be deposited by electron-beam evaporation or by sputtering. Typical applications include near-UV to near-IR antireflection and multilayer filter coatings. Tantala can be used in combination with low-index Silicon dioxide layers to form high index-contrast multilayer structures ranging from wide-band AR coatings to bandpass filters and dichroic beam-splitters.
Tantalum pentoxide (Ta2O5) is extensively studied for its attractive properties in dielectric films, anti-reflection coatings, and resistive switching memory. Although various crystalline structures of tantalum pentoxide have been reported, its structural, electronic, and optical properties still remain a subject of research. We investigate the electronic and optical properties of crystalline and amorphous Ta2O5 structures using first-principles calculations based on density functional theory and the GW method.
Oman, Bahrain, Abu Dhabi, Ajman, Al Ain, Dubai, Ras Al-Khaimah, Fujairah, Sharjah, Umm Al Quwain, Ruwais, Mina Zayed, Khalifa Port, Kizad, Jebel Ali, Port Rashid, Khor Fakkan, Sharjah Creek, Port of Hamriyah, Mussafah Port, Saqr Port, Dibba Port, Jebel Dhanna, Mina Al Hamriya, and all major UAE ports.